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[Analysis Case] Metal Analysis in Organic Materials

[Analysis Case] Metal Analysis in Organic Materials

Microwave decomposition combined with ICP-MS! Metal analysis in organic materials is possible.

Our organization conducts metal analysis in organic materials. Metal components can cause a decrease in insulation properties when they contaminate organic materials, such as in semiconductor devices. Therefore, it is important to understand the amount of metal in organic materials. In this case, we analyzed the metal content in organic materials (polyethylene products, polypropylene products, polyimide films). Organic materials can be acid-digested by irradiating them with microwaves in a sealed state (under high temperature and pressure). [Measurement Method / Processing Method] ■ [ICP-MS] Inductively Coupled Plasma Mass Spectrometry *For more details, please download the PDF or feel free to contact us.

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Technical Information Magazine 202201-02 fsLA-ICP-MS

Technical Information Magazine 202201-02 fsLA-ICP-MS

Femtosecond laser ablation-inductively coupled plasma mass spectrometry is a useful method for analyzing the two-dimensional distribution of elements present in trace amounts in biological tissues.

The technical information magazine The TRC News provides the latest information on analytical techniques that are useful for research and development, solving production troubles, and quality control. [Abstract] fsLA-ICP-MS (femtosecond laser ablation-inductively coupled plasma mass spectrometry) is a method capable of rapidly and sensitively analyzing inorganic elements in solid samples at a local level, and it has garnered attention as a useful technique for two-dimensional distribution analysis of elements present in trace amounts within biological tissues. This paper introduces the characteristics of fsLA-ICP-MS, examples of drug distribution evaluation in tissues, and quantitative imaging examples using custom-prepared standards. [Table of Contents] 1. Introduction 2. Overview and Characteristics of fsLA-ICP-MS 3. Evaluation of Boron Drug Distribution for BNCT 4. Quantitative Imaging of Iron and Zinc in Mouse Spinal Cord 5. Conclusion

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[Analysis Case] Metal Contamination Analysis of Si Wafer Surface (B0233)

[Analysis Case] Metal Contamination Analysis of Si Wafer Surface (B0233)

It is possible to obtain a large amount of metal element information at once through qualitative and semi-quantitative analysis!

We offer metal contamination analysis of Si wafers (B0233). The purpose of metal contamination analysis of Si wafer surfaces using ICP-MS includes not only the contamination assessment of the Si wafer itself but also the evaluation of contamination within semiconductor devices and the assessment of the working environment due to Si wafer exposure. Therefore, the analysis of Si wafer surfaces is conducted for various purposes. ICP-MS analysis allows for the highly sensitive measurement of metal contamination on Si wafer surfaces, and it is also possible to specify the evaluation area according to the purpose. [Measurement Method] ■ [ICP-MS] Inductively Coupled Plasma Mass Spectrometry *For more details, please download the PDF or feel free to contact us.

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